@Article{PillacaKostUeda:2014:StMaFi,
author = "Pillaca, Elver Juan de Dios Mitma and Kostov, K G and Ueda,
Mario",
affiliation = "{Universidade Estadual Paulista (UNESP. FEG)} and {Universidade
Estadual Paulista (UNESP)} and {Instituto Nacional de Pesquisas
Espaciais (INPE)}",
title = "Study of magnetic field enhanced plasma immersion ion implantation
in Silicon",
journal = "Journal of Physics: Conference Series",
year = "2014",
volume = "511",
pages = "012084--012090",
abstract = "A comparison between experimental measurements and numerical
calculations of the ion current distribution in plasma immersion
ion implantation (PIII) with external magnetic field is presented.
Later, Silicon samples were implanted with nitrogen ion to analyze
the effect on them. The magnetic field considered is essentially
non-uniform and is generated by two magnetic coils installed on
vacuum chamber. The presence of both, electric and magnetic field
in PIII create a crossed ExB field system, promoting drift
velocity of the plasma around the target. The results found shows
that magnetized electrons drifting in ExB field provide
electron-neutral collision. The efficient ionization increases the
plasma density around the target where a magnetic confinement is
formed. As result, the ion current density increases, promoting
significant changes in the samples surface properties, especially
in the surface wettability.",
doi = "10.1088/1742-6596/511/1/012084",
url = "http://dx.doi.org/10.1088/1742-6596/511/1/012084",
issn = "1742-6588",
label = "lattes: 3956926180174007 1 PillacaKostUeda:2014:StMaFi",
language = "pt",
urlaccessdate = "27 abr. 2024"
}